CH ENGR 234

Main Course

Plasma Chemistry and Engineering

Description

Lecture, four hours; outside study, eight hours. Designed for graduate chemistry or engineering students. Application of chemistry, physics, and engineering principles to design and operation of plasma and ion-beam reactors used in etching, deposition, oxidation, and cleaning of materials. Examination of atomic, molecular, and ionic phenomena involved in plasma and ion-beam processing of semiconductors, etc. Letter grading.